Installation for Thermoreflectometry of Semiconductor Materials in a Strong Magnetic Field at Low Temperatures
- Autores: Kotov A.N.1, Starostin A.A.1, Shangin V.V.1, Bobin S.B.2, Lonchakov A.T.2
 - 
							Afiliações: 
							
- Institute of Thermal Physics of the Ural Branch of the Russian Academy of Sciences
 - Mikheev Institute of Metal Physics of the Ural Branch of the Russian Academy of Sciences
 
 - Edição: Nº 4 (2023)
 - Páginas: 89-91
 - Seção: ОБЩАЯ ЭКСПЕРИМЕНТАЛЬНАЯ ТЕХНИКА
 - URL: https://vietnamjournal.ru/0032-8162/article/view/670479
 - DOI: https://doi.org/10.31857/S0032816223030230
 - EDN: https://elibrary.ru/CWJFVM
 - ID: 670479
 
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Resumo
An experimental cell design and an optoelectronic unit have been developed for studying relaxation processes in the near-surface region of semiconductors under pulsed laser irradiation in a temperature range from 3 to 300 K and a magnetic field up to 12 T.
Sobre autores
A. Kotov
Institute of Thermal Physics of the Ural Branch of the Russian Academy of Sciences
														Email: artem625@mail.ru
				                					                																			                												                								Russia, 620016, Yekaterinburg						
A. Starostin
Institute of Thermal Physics of the Ural Branch of the Russian Academy of Sciences
														Email: artem625@mail.ru
				                					                																			                												                								Russia, 620016, Yekaterinburg						
V. Shangin
Institute of Thermal Physics of the Ural Branch of the Russian Academy of Sciences
														Email: artem625@mail.ru
				                					                																			                												                								Russia, 620016, Yekaterinburg						
S. Bobin
Mikheev Institute of Metal Physics of the Ural Branch of the Russian Academy of Sciences
														Email: artem625@mail.ru
				                					                																			                												                								Russia, 620108, Yekaterinburg						
A. Lonchakov
Mikheev Institute of Metal Physics of the Ural Branch of the Russian Academy of Sciences
							Autor responsável pela correspondência
							Email: artem625@mail.ru
				                					                																			                												                								Russia, 620108, Yekaterinburg						
Bibliografia
- Starostin A.A., Shangin V.V., Lonchakov A.T., Kotov A.N., Bobin S.B. // Annalen der Physik 2020. V. 532. Iss. 8. P. 1900586. https://doi.org/10.1002/andp.201900586
 - Wang T., Zheng S., Yang Z. // Sensors and Actuators A. 1998. V. 69. P. 134.
 - Новицкий Л.А., Кожевников И.Г. Теплофизические свойства материалов при низких температурах. Справочник. М.: Машиностроение, 1975.
 
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