作者的详细信息
Рахимова, Т. В.
| 期 | 栏目 | 标题 | 文件 |
| 编号 11 (2024) | Articles | Oxidation and Etching of Thin Ruthenium Films in Low Ion Energy Oxygen Plasma |
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X-ray diffraction
X-ray photoelectron spectroscopy
atomic force microscopy
density functional theory
electron microscopy
electronic structure
ion implantation
irradiation
magnetron sputtering
microstructure
nanoparticles
neutron reflectometry
phase composition
scanning electron microscopy
silicon
structure
surface
surface morphology
synchrotron radiation
thin films
zinc oxide
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编号 11 (2024)
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关键字
X-ray diffraction
X-ray photoelectron spectroscopy
atomic force microscopy
density functional theory
electron microscopy
electronic structure
ion implantation
irradiation
magnetron sputtering
microstructure
nanoparticles
neutron reflectometry
phase composition
scanning electron microscopy
silicon
structure
surface
surface morphology
synchrotron radiation
thin films
zinc oxide
最新一期