Negative anisotropy in Ni–Fe films
- 作者: Savin P.A.1, Adanakova O.A.1, Lepalovskij V.N.1, Kudyukov E.V.1, Vas’kovskiy V.O.1,2
-
隶属关系:
- Ural Federal University
- Mikheev Institute of Metal Physics, Ural Branch of the Russian Academy of Sciences
- 期: 卷 87, 编号 4 (2023)
- 页面: 500-503
- 栏目: Articles
- URL: https://vietnamjournal.ru/0367-6765/article/view/654424
- DOI: https://doi.org/10.31857/S0367676522700880
- EDN: https://elibrary.ru/NLMHKW
- ID: 654424
如何引用文章
详细
Fe–Ni films were obtained in which the effect of “negative anisotropy” is observed. This effect consists in the formation of easy magnetization axis perpendicular to the deposition field. A model based on negative magnetostriction, and inhomogeneous stresses is tested. The model parameters were varied by applying additional stresses to the film. The effect of additional stresses is analyzed by changing the shape of the R–H curves. It is shown that changes in anisotropy occur in accordance with the model.
作者简介
P. Savin
Ural Federal University
编辑信件的主要联系方式.
Email: Peter.Savin@urfu.ru
Russia, 620002, Yekaterinburg
O. Adanakova
Ural Federal University
Email: Peter.Savin@urfu.ru
Russia, 620002, Yekaterinburg
V. Lepalovskij
Ural Federal University
Email: Peter.Savin@urfu.ru
Russia, 620002, Yekaterinburg
E. Kudyukov
Ural Federal University
Email: Peter.Savin@urfu.ru
Russia, 620002, Yekaterinburg
V. Vas’kovskiy
Ural Federal University; Mikheev Institute of Metal Physics, Ural Branch of the Russian Academy of Sciences
Email: Peter.Savin@urfu.ru
Russia, 620002, Yekaterinburg; Russia, 620108, Yekaterinburg
参考
- Blois M.S. // J. Appl. Phys. 1955. V. 26. P. 975.
- Jogschies L., Klaas D., Kruppe R. et al. // Sensors. 2015. V. 15. Art. No. 28665.
- Smith D.O. // Appl. Phys. Lett. 1963. V. 2. P. 191.
- Soohoo R.F. // Czech. J. Phys. 1971. V. 21. P. 494.
- Savin P.A., Adanakova O.A., Lepalovskij V.N. et al. // J. Phys. Conf. Ser. 2019. V. 1389. Art. No. 012122.
- Лесник А.Г. Индуцированная магнитная анизотропия. Киев: Наукова думка, 1976. 160 с.
- Miyazaki T., Oomori T., Sato F. et al. // J. Magn. Magn. Mater. 1994. V. 129. Art. No. L135.
- Савин П.А., Васьковский В.О., Кандаурова Г.С., Лепаловский В.Н. // Микроэлектроника. 1991. Т. 20. С. 407.
- Maissel L.I., Glang R. Handbook of thin film technology. N.Y.: McGraw Hill, 1970.
- Zhukov A., González J., Blanco M. et al. // J. Mater. Res. 2000. V. 15. P. 2107.
补充文件
