Amorphous SICX:H and SICXNY:H films obtained from hexamethyldisilane vapor in inductively coupled RF discharge plasma

封面

如何引用文章

全文:

开放存取 开放存取
受限制的访问 ##reader.subscriptionAccessGranted##
受限制的访问 订阅或者付费存取

详细

Amorphous films of hydrogenated silicon carbide SiCx:H and carbonitride SiCxNy:H have been synthesized in an RF inductively coupled plasma reactor using hexamethyldisilane vapor and additional argon and/or nitrogen gases. The deposition process was carried out at temperatures of 50–400°C and plasma powers of 100–400 W. The dependences of the growth rate, chemical composition and structure of films, light transmittance, refractive index, and optical band gap on synthesis conditions have been obtained. An in situ study of the gas phase composition was performed using optical emission spectroscopy.

全文:

受限制的访问

作者简介

M. Chagin

Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences

Email: marina@niic.nsc.ru
俄罗斯联邦, Novosibirsk

E. Ermakova

Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences

Email: marina@niic.nsc.ru
俄罗斯联邦, Novosibirsk

V. Shayapov

Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences

Email: marina@niic.nsc.ru
俄罗斯联邦, Novosibirsk

V. Sulyaeva

Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences

Email: marina@niic.nsc.ru
俄罗斯联邦, Novosibirsk

E. Maksimovskii

Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences

Email: marina@niic.nsc.ru
俄罗斯联邦, Novosibirsk

I. Yushina

Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences

Email: marina@niic.nsc.ru
俄罗斯联邦, Novosibirsk

M. Kosinova

Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences

编辑信件的主要联系方式.
Email: marina@niic.nsc.ru
俄罗斯联邦, Novosibirsk

参考

  1. Ermakova E., Kosinova M. // J. Organomet. Chem. 2022. V. 958. P. 122183.
  2. Gilman A.B., Zinoviev A.V., Kuznetsov A.A. // High Energy Chemistry. 2022. V. 56. № 6. P. 470.
  3. Fainer N.I., Nemkova A.A. // High Energy Chemistry. 2015. V. 49. № 4. P. 308
  4. Wróbel A.M., Wickramanayaka S., Nakanishi Y., et al. // Diam. Relat. Mater. 1997. V. 6. P. 1081
  5. Wickramanayaka S., Hatanaka Y., Nakanishi Y., Wróbel A.M. // J. Electrochem. Soc. 1994. V. 141. № 10. P. 2910.
  6. Neileth S. Figueroa, J.L. Nachez, F.L. et al. // J. Ceram. Soc. Japan. 2009. V. 117. P. 558.
  7. Cho S.H., Choi D.J. // J. Ceram. Soc. Japan. 2009. V. 117. P. 558.
  8. Jun S. Lee, Su B. et al. // Curr. Appl. Phys. 2015. V. 15. P. 1342.
  9. Choi Y.S, Lee J.S., Jin S.B., Han J.G. // J. Phys. D: Appl. Phys. 2013. V. 46. P. 315501.
  10. Shim C., Jung D. // Jpn. J. Appl. Phys. 2004. V. 43. P. 940.
  11. Klumpp A., Schaber U., Offereins H.L. et al. // Sens. Actuators A Phys., 1994. V. 41. P. 310.
  12. Ito H., Kumakura M., Suzuki T. et al. // Jpn. J. Appl. Phys. 2016. V. 55. P. 06HC01.
  13. Orlikovskiy A.A., Rudenko K.V., Averkin S.N. // High Energy Chemistry. 2006. V. 40. № 3. P. 220.
  14. Pearse R.W.B., Gaydon A.G. The Identification of Molecular Spectra. Hoboken, NY, USA: J. Wiley& Sons, 1963.
  15. Dieke G.H. The Hydrogen Molecule Wavelength Tables of Gerhard Heinrich Dieke. Ed. Crosswhite H.M., New York, NY, USA: Wiley-InterScience. 1972.
  16. NIST Atomic Spectra Database; NIST Standard Reference. Database 78, Version 5.9. Available online: https://physics.nist.gov/asd
  17. Rumyantsev Yu.M., Chagin M.N., Shayapov V.R. et al. // Glass Phys. Chem. 2018. V. 44. №. 3. P. 174.
  18. Chagin M.N., Sulyaeva V.S., Shayapov V.R. et al. // Coatings. 2022. V. 12. P. 80
  19. Tolstoy V.P., Chernyshova I.V., Skryshevsky V.A. Handbook of Infrared Spectroscopy of Ultrathin Films. Hoboken, NJ, USA: John Wiley & Sons, Inc.: 2003. 739 p.
  20. Bellamy L.J. The Infrared Spectra of Complex Molecules. London, United Kingdom: Springer, 1975. 433 p.
  21. Launer P.J.; Arkles B. Infrared analysis of organosilicon compounds: Spectra-structure correlations. In Silicon Compounds: Silanes & Silicones. Morrisville, PA, USA: Gelest, Inc. 2013.
  22. Stuart B.H. Infrared spectroscopy: fundamentals and applications. John Wiley & Sons Ltd, 2004. 224 p.

补充文件

附件文件
动作
1. JATS XML
下载
2. Fig. 1. Emission spectra of ICP plasma (P = 400 W) of GDS+Ar(a) and GMS+Ar+N2 mixtures at F(N2)/[F(N2)+F(Ar)] = 0.5 (b).

下载 (147KB)
索引源数据
3. Fig. 2. Dependences of the emission intensity of the CN band (a) and the Hß line (b) on the RF discharge power for mixtures of GMDS + Ar (squares), GMDS + Ar + N2 (circles), GMDS + N2 (triangles).

下载 (98KB)
索引源数据
4. 3. Dependences of the emission intensity of the Si line (a) and the C2 band (b) on the RF discharge power for mixtures of GDS + Ar (squares), GMS + Ar + N2 (circles), GMDS + N2 (triangles).

下载 (92KB)
索引源数据
5. 4. The dependence of the elemental composition of films on (a) the deposition temperature, (b) the plasma power, and (c) the nitrogen content in the initial gas mixture GMDS + Ar + N2.

下载 (195KB)
索引源数据
6. Fig. 5. Evolution of IR spectra of Siox films:H when (a) the synthesis temperature and (b) the plasma power change.

下载 (217KB)
索引源数据

版权所有 © Russian Academy of Sciences, 2024